structure of TETRAKIS(ETHYLMETHYLAMINO)HAFNIUM CAS 352535-01-4

TETRAKIS(ETHYLMETHYLAMINO)HAFNIUM CAS 352535-01-4

Identification

CAS Number

352535-01-4

Name

TETRAKIS(ETHYLMETHYLAMINO)HAFNIUM

Synonyms

352535-01-4 [RN]
Ethanamine, N-methyl-, hafnium salt (4:1) [ACD/Index Name]
Hafnium tetrakis[ethyl(methyl)azanide] [ACD/IUPAC Name]
Hafniumtetrakis[ethyl(methyl)azanid] [German] [ACD/IUPAC Name]
MFCD03427130 [MDL number]
TEMAH
Tetrakis(ethylmethylamido)hafnium(IV)
Tetrakis(ethylmethylamino)hafnium(IV)
Tétrakis[éthyl(méthyl)azanide] d’hafnium [French] [ACD/IUPAC Name]
ETHANAMINE, N-METHYL-, HAFNIUM(4+) SALT (4:1)
ETHYL(METHYL){TRIS[ETHYL(METHYL)AMINO]HAFNIO}AMINE
HAFNIUM TETRAKIS(ETHYLMETHYLAMIDE)
temah: hf[n(ch3)(ch2ch3)]4
Tetrakis(ethylmethylamino)hafnium

SMILES

CCN(C)[Hf](N(C)CC)(N(C)CC)N(C)CC

StdInChI

InChI=1S/4C3H8N.Hf/c41-3-4-2;/h43H2,1-2H3;/q4*-1;+4

StdInChIKey

NPEOKFBCHNGLJD-UHFFFAOYSA-N

Molecular Formula

C12H32HfN4

Molecular Weight

410.899

MDL Number

MFCD03427130

Properties

Appearance

Colorless liquid

Structure

structure of TETRAKIS(ETHYLMETHYLAMINO)HAFNIUM CAS 352535-01-4

Structure of TETRAKIS(ETHYLMETHYLAMINO)HAFNIUM CAS 352535-01-4

Safety Data

Symbol

exclamation-mark-jpgexclamation-mark-jpgexclamation-mark-jpgGHS02,GHS05,GHS07

Signal Word

Warning

Hazard statements

H225 – H260 – H302 – H314 – H335

Precautionary Statements

P210 – P231 + P232 – P280 – P301 + P312 – P303 + P361 + P353 – P305 + P351 + P338

WGK Germany

3

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Specifications and Other Information of Our

Identification Methods

MS

Purity

99.99% min

Chloride ion

≤10ppm

Shelf Life

1 year

Known Application

TETRAKIS(ETHYLMETHYLAMINO)HAFNIUM CAS 352535-01-4 is a common metal-organic precursor used in thin film deposition in the semiconductor industry. It is employed for the deposition of high-quality HfO2 (hafnium oxide) thin films, which are crucial in manufacturing high-dielectric constant materials and Metal-Insulator-Semiconductor Field-Effect Transistors (MISFETs).

General View of Documents

This product is developed by our R&D company Warshel Chemical Ltd (https://www.warshel.com/).

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